Raith e-beam Facility

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Raith e-beam Facility
Atoms to Devices

Raith e_Line electron-beam lithography facility provides a dedicated electron beam lithography system. This instrument directly patterns thin layers of resist by scanning an electron beam over the surface and can routinely achieve sub-20nm linewidth on PMMA resist.

A wide range of materials can be patterned using CAD software with minimum feature sizes around 10nm. Flexibility and speed make it an ideal tool for prototyping nano-devices

Resolution 20nm
Electron Beam resist processes
495 & 950 PMMA
Sample size from 10 x10mm up to 150mm diameter


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